Deposition of MAX phase-containing thin films from a (Ti,Zr)2AlC compound target

Research output: Contribution to journalArticle

Authors

  • Clio Azina
  • Bensu Tunca
  • Andrejs Petruhins
  • Binbin Xin
  • Melike Mercan Yildizhan
  • Per O. A. Persson
  • Jozef Vleugels
  • Konstantza Lambrinou
  • Johanna Rosen
  • Per Eklund

Institutes & Expert groups

  • Li.U - Linköping University
  • KUL - Katholieke Universiteit Leuven

Documents & links

Abstract

This work reports on sputter depositions carried out from a compound (Ti,Zr)2AlC target on Al2O3(0 0 0 1) substrates at temperatures ranging between 500 and 900 ◦C. Short deposition times yielded 30–40 nm-thick Alcontaining (Ti,Zr)C films, whereas longer depositions yielded thicker films up to 90 nm which contained (Ti,Zr)C and intermetallics. At 900 ◦C, the longer depositions led to films that also consisted of solid solution MAX phases. Detailed transmission electron microscopy showed that both (Ti,Zr)2AlC and (Ti,Zr)3AlC2 solid solution MAX phases were formed. Moreover, this work discusses the growth mechanism of the thicker films, which started with the formation of the mixed (Ti,Zr)C carbide, followed by the nucleation and growth of aluminides, eventually leading to solid state diffusion of Al within the carbide, at the highest temperature (900 ◦C) to form the MAX phases.

Details

Original languageEnglish
Article number149370
Pages (from-to)1-8
Number of pages8
JournalApplied Surface Science
Volume551
DOIs
Publication statusPublished - 25 Feb 2021

Keywords

  • Magnetron sputtering, MAX phase solid solution, Compound target, (TiZr)2AlC

ID: 7157683