Deposition of MAX phase-containing thin films from a (Ti,Zr)2AlC compound target

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Deposition of MAX phase-containing thin films from a (Ti,Zr)2AlC compound target. / Azina, Clio; Tunca, Bensu; Petruhins, Andrejs; Xin, Binbin; Yildizhan, Melike Mercan; Persson, Per O. A.; Vleugels, Jozef; Lambrinou, Konstantza; Rosen, Johanna; Eklund, Per.

In: Applied Surface Science, Vol. 551, 149370, 25.02.2021, p. 1-8.

Research output: Contribution to journalArticlepeer-review

Harvard

Azina, C, Tunca, B, Petruhins, A, Xin, B, Yildizhan, MM, Persson, POA, Vleugels, J, Lambrinou, K, Rosen, J & Eklund, P 2021, 'Deposition of MAX phase-containing thin films from a (Ti,Zr)2AlC compound target', Applied Surface Science, vol. 551, 149370, pp. 1-8. https://doi.org/10.1016/j.apsusc.2021.149370

APA

Azina, C., Tunca, B., Petruhins, A., Xin, B., Yildizhan, M. M., Persson, P. O. A., Vleugels, J., Lambrinou, K., Rosen, J., & Eklund, P. (2021). Deposition of MAX phase-containing thin films from a (Ti,Zr)2AlC compound target. Applied Surface Science, 551, 1-8. [149370]. https://doi.org/10.1016/j.apsusc.2021.149370

Vancouver

Azina C, Tunca B, Petruhins A, Xin B, Yildizhan MM, Persson POA et al. Deposition of MAX phase-containing thin films from a (Ti,Zr)2AlC compound target. Applied Surface Science. 2021 Feb 25;551:1-8. 149370. https://doi.org/10.1016/j.apsusc.2021.149370

Author

Azina, Clio ; Tunca, Bensu ; Petruhins, Andrejs ; Xin, Binbin ; Yildizhan, Melike Mercan ; Persson, Per O. A. ; Vleugels, Jozef ; Lambrinou, Konstantza ; Rosen, Johanna ; Eklund, Per. / Deposition of MAX phase-containing thin films from a (Ti,Zr)2AlC compound target. In: Applied Surface Science. 2021 ; Vol. 551. pp. 1-8.

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@article{3208da647b294b56b60c11dd64d07733,
title = "Deposition of MAX phase-containing thin films from a (Ti,Zr)2AlC compound target",
abstract = "This work reports on sputter depositions carried out from a compound (Ti,Zr)2AlC target on Al2O3(0 0 0 1) substrates at temperatures ranging between 500 and 900 ◦C. Short deposition times yielded 30–40 nm-thick Alcontaining (Ti,Zr)C films, whereas longer depositions yielded thicker films up to 90 nm which contained (Ti,Zr)C and intermetallics. At 900 ◦C, the longer depositions led to films that also consisted of solid solution MAX phases. Detailed transmission electron microscopy showed that both (Ti,Zr)2AlC and (Ti,Zr)3AlC2 solid solution MAX phases were formed. Moreover, this work discusses the growth mechanism of the thicker films, which started with the formation of the mixed (Ti,Zr)C carbide, followed by the nucleation and growth of aluminides, eventually leading to solid state diffusion of Al within the carbide, at the highest temperature (900 ◦C) to form the MAX phases.",
keywords = "Magnetron sputtering, MAX phase solid solution, Compound target, (TiZr)2AlC",
author = "Clio Azina and Bensu Tunca and Andrejs Petruhins and Binbin Xin and Yildizhan, {Melike Mercan} and Persson, {Per O. A.} and Jozef Vleugels and Konstantza Lambrinou and Johanna Rosen and Per Eklund",
note = "Score=10",
year = "2021",
month = feb,
day = "25",
doi = "10.1016/j.apsusc.2021.149370",
language = "English",
volume = "551",
pages = "1--8",
journal = "Applied Surface Science",
issn = "0169-4332",
publisher = "Elsevier",

}

RIS - Download

TY - JOUR

T1 - Deposition of MAX phase-containing thin films from a (Ti,Zr)2AlC compound target

AU - Azina, Clio

AU - Tunca, Bensu

AU - Petruhins, Andrejs

AU - Xin, Binbin

AU - Yildizhan, Melike Mercan

AU - Persson, Per O. A.

AU - Vleugels, Jozef

AU - Lambrinou, Konstantza

AU - Rosen, Johanna

AU - Eklund, Per

N1 - Score=10

PY - 2021/2/25

Y1 - 2021/2/25

N2 - This work reports on sputter depositions carried out from a compound (Ti,Zr)2AlC target on Al2O3(0 0 0 1) substrates at temperatures ranging between 500 and 900 ◦C. Short deposition times yielded 30–40 nm-thick Alcontaining (Ti,Zr)C films, whereas longer depositions yielded thicker films up to 90 nm which contained (Ti,Zr)C and intermetallics. At 900 ◦C, the longer depositions led to films that also consisted of solid solution MAX phases. Detailed transmission electron microscopy showed that both (Ti,Zr)2AlC and (Ti,Zr)3AlC2 solid solution MAX phases were formed. Moreover, this work discusses the growth mechanism of the thicker films, which started with the formation of the mixed (Ti,Zr)C carbide, followed by the nucleation and growth of aluminides, eventually leading to solid state diffusion of Al within the carbide, at the highest temperature (900 ◦C) to form the MAX phases.

AB - This work reports on sputter depositions carried out from a compound (Ti,Zr)2AlC target on Al2O3(0 0 0 1) substrates at temperatures ranging between 500 and 900 ◦C. Short deposition times yielded 30–40 nm-thick Alcontaining (Ti,Zr)C films, whereas longer depositions yielded thicker films up to 90 nm which contained (Ti,Zr)C and intermetallics. At 900 ◦C, the longer depositions led to films that also consisted of solid solution MAX phases. Detailed transmission electron microscopy showed that both (Ti,Zr)2AlC and (Ti,Zr)3AlC2 solid solution MAX phases were formed. Moreover, this work discusses the growth mechanism of the thicker films, which started with the formation of the mixed (Ti,Zr)C carbide, followed by the nucleation and growth of aluminides, eventually leading to solid state diffusion of Al within the carbide, at the highest temperature (900 ◦C) to form the MAX phases.

KW - Magnetron sputtering

KW - MAX phase solid solution

KW - Compound target

KW - (TiZr)2AlC

UR - https://ecm.sckcen.be/OTCS/llisapi.dll/open/44822108

U2 - 10.1016/j.apsusc.2021.149370

DO - 10.1016/j.apsusc.2021.149370

M3 - Article

VL - 551

SP - 1

EP - 8

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

M1 - 149370

ER -

ID: 7157683