In-Situ X-ray Diffraction Study of the U(Mo)/Si Solid State Reaction

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Abstract

The solid state reaction between U(Mo) and Si, leading to the formation of silicides, has been studied using in situ X-ray Diffraction. Samples were prepared by sputter depositing Si in thin layers on U(Mo) substrates and vice versa. Several samples were heated to temperatures up to 950 ºC in a purified helium atmosphere. Even though the measurements were hampered by the undesired oxidation of uranium, the formation of various silicides could be observed. Kissinger analysis on ramp anneals with ramp rates of 0.2, 0.5, 1 and 3 ºC/s have been performed to investigate the kinetics of the formed silicides. Using this method, the apparent activation energy for the different silicide formation reactions was deduced.

Details

Original languageEnglish
Title of host publicationInternational Meeting on Reduced Enrichment for Research and Test Reactors
Place of PublicationArgonne, IL, United States
Publication statusPublished - Oct 2010
EventInternational Meeting on Reduced Enrichment for Research and Test Reactors - Lisbon, Portugal
Duration: 10 Oct 201014 Oct 2010

Conference

ConferenceInternational Meeting on Reduced Enrichment for Research and Test Reactors
CountryPortugal
CityLisbon
Period2010-10-102010-10-14

Keywords

  • solid state reaction, Kissinger analysis, uranium silicide formation

ID: 67975